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Reactive Sputtering Process Stability Reinforced by Advanced Energy’s Power Delivery Technology

Juni 22, 2026

By Saeed Mirzaei

This blog explores how oxygen and water vapor dynamics shape plasma behavior and TiO₂ film quality in reactive sputtering. Using Advanced Energy’s Ascent AMS and Ascent DMS power supplies, AE experts demonstrate how advanced pulsed‑DC regulation stabilizes deposition despite fluctuating reactive conditions. The study introduces a unified p* parameter that correlates gas effects with deposition rate and optical properties, offering a predictive path to more uniform, high‑performance oxide coatings.

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Blog

New Microohmmeter Probes are Rugged and Comfortable

September 23, 2014

By Advanced Energy Editor

Advanced Energy's TEGAM, a leading supplier of innovative microohmmeters, has just introduced five new Kelvin probes.

Blog

Dual Magnetron Sputtering (DMS): The Basics

Juni 11, 2014

By Dave Christie

Magnetron sputtering systems are used to deposit complex layer systems on solid substrates and flexible webs for various uses, including display, flexible electronics, packaging, lighting, decorative, architectural, and automotive applications.
Thin Films

Blog

Controlling Pulsed DMS Reactive Sputtering Processes: Getting a Solid Voltage Feedback Signal

April 22, 2014

By Dave Christie

Large-area coating is used to deposit complex layer systems on glass for architectural and automotive applications, and a myriad of others, including coatings on flexible webs.
Thin Films

Blog

Advanced Energy's TEGAM Awarded Patent for Advanced Thermistor Design

März 26, 2014

By Advanced Energy Editor

TEGAM a leading supplier of innovative RF power measurements, was recently awarded Patent No. 8,558,556, “Planar-axial thermistor for bolometry.”

Blog

Choosing Between DC and RF for Sputtering Applications

März 11, 2014

By Doug Pelleymounter

I get this question a lot: “How do I know when to use DC and when to use RF for a sputtering application?” Of course, the first thing to consider is film requirements.
Thin Films

Blog

Increasing Flow to Increase Power: How Voltage Control Works

Februar 25, 2014

By Advanced Energy Admin

Controlling reactive sputtering processes is challenging, and there are several options.
Thin Films

Blog

Innovating Cathodic Arc Deposition: High-Performance Bias

Februar 11, 2014

By Uwe Krause

The “field” we work in (That’s why we are called “field” applications engineers.) involves an endless variety of technology and customers.
Thin Films

Blog

Controlling Reactive Sputtering Processes: Why Voltage Control?

Januar 28, 2014

By Dave Christie

Reactive sputtering is used for a tremendous variety of industrial coating applications.
Thin Films

Blog

5 Easy Steps to 5X Full Oxide Rate

Januar 14, 2014

By Doug Pelleymounter

Process engineers understand the benefits of achieving higher deposition rates while using less incoming power.
Thin Films
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